| Brand Name: | Hoan |
| Model Number: | HACC221S30V500 |
| MOQ: | 10 Pieces |
| Payment Terms: | L/C,D/A,D/P,T/T |
Entity summary. The HACC221S30V500 is a 220pF ±10% single-layer MOS capacitor in the Hoan HACC series, rated at 30V DC. It is built on a float-zone silicon substrate with a thermally grown oxide dielectric and a customizable thin-film metallization stack, in a 0.50mm × 0.50mm × 0.15mm chip. It is intended for precision RF applications where a predictable, linear capacitance-versus-voltage response and customer-specified metallization or trimmed capacitance values are required.
The metallization system and the final capacitance value can both be set at the wafer level to fit the customer process.
| Parameter | Value | Condition |
| Capacitance | 220pF ±10% (±5% trimmed option) | 1MHz, 1.0Vrms |
| Rated DC Voltage | 30V | Continuous operation |
| Dielectric Withstanding Voltage | >100V DC | 1 minute, 25°C |
| C-V Linearity (Voltage Coefficient) | <10 ppm/V | 0V to 30V DC |
| Dielectric Absorption | <0.1% | Typical |
| Intrinsic Chip ESL | <0.05nH | De-embedded from S-parameters |
| Dissipation Factor | ≤2.5% | 1kHz, 1Vrms |
| Q Factor @ 1MHz | >2000 | Typical |
| Q Factor @ 1GHz | >300 | Typical |
| Insulation Resistance | ≥1×104 MΩ | At rated voltage DC |
| Leakage Current | <10nA | 30V DC, 25°C |
| TCC | +35ppm/°C | -55°C to +125°C |
| Dielectric | Thermal oxide (paraelectric) | — |
| Substrate | Float-zone Si, >1000Ω·cm | — |
| Chip Dimensions | 0.50 × 0.50 × 0.15mm | Custom AR up to 4:1 available |
| Top Metallization | TiW + Au, 1.0-4.0µm (custom) | Thickness to customer spec |
| Backside Metallization | TiW-Pt-Au, Au ≥1.0µm | Pt barrier, Ag-epoxy compatible |
| Operating Temperature | -55°C to +125°C | — |
| Storage Temperature | -65°C to +150°C | — |
| RoHS | Compliant | EU 2015/863 |
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