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Self-Aligned Sub-Micron Metal Electrode MOS Capacitor HACC106S30V330 330pF 30V Dispersion Free Chip

Self-Aligned Sub-Micron Metal Electrode MOS Capacitor HACC106S30V330 330pF 30V Dispersion Free Chip

Brand Name: Hoan
Model Number: HACC106S30V330
MOQ: 10 Pieces
Payment Terms: L/C,D/A,D/P,T/T
Detail Information
Place of Origin:
Shaanxi, China
Certification:
ISO 9001:2015, RoHS
Top Metallization:
Au, 2.5 Um Min
Backside Metallization:
Au, 1.0 Um Min
Operating Temperature:
-55°C To +125°C
RoHS:
EU 2015/863 Compliant
ESD Class:
Class 0 (HBM)
Mounting Type:
Wire Bondable / Eutectic Die Attach
Highlight:

Self-Aligned MOS Capacitor 330pF 30V

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Sub-Micron Metal Electrode MOS Capacitor

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Dispersion Free Chip MOS Capacitor

Product Description

Self-Aligned Sub-Micron Top Metal MOS Capacitor HACC106S30V330 330pF 30V


Summary: The HACC106S30V330 is a 330 pF ±10%, 30 V DC single-layer MOS capacitor with a self-aligned sub-micron top metal electrode and a dispersion-free RF response. It is intended for compact millimetre-wave circuits that need a fine electrode geometry and a stable capacitance value.

Overview


The HACC106S30V330 is built on a float-zone silicon substrate (above 1000 Ω·cm) with a 300 nm thermal SiO2 dielectric. The top electrode is defined by a self-aligned lift-off process that produces a sub-micron metal geometry, which allows a smaller pad pitch and a lower parasitic capacitance per connection. The chip measures 0.40 × 0.40 × 0.15 mm with 2.5 µm minimum gold top metallization. The part is a die-level single-layer MOS capacitor (a wire bondable capacitor) for hybrid and chip-and-wire assemblies, also referred to as a single-layer capacitor (SLC) chip.


Key Features


  • Self-aligned sub-micron top metal for fine pad pitch and low parasitic capacitance.
  • Dispersion-free response with capacitance within ±1% from 100 Hz to 40 GHz.
  • Compact 0.40 × 0.40 × 0.15 mm die.
  • 330 pF ±10% (5% available) at 30 V DC with no DC bias derating.
  • Intrinsic ESL below 0.05 nH; Q > 2000 at 1 MHz.
  • ISO 9001:2015 and RoHS compliant, wire bondable gold metallization.
  • Custom capacitance values available on the same die platform.


Electrical Specifications (T = 25°C unless noted)


Parameter Value Test Condition
Capacitance 330 pF ±10% 1 MHz, 1.0 Vrms
Capacitance Tolerance Options ±10% (K), ±5% (J)
Top Metal Geometry Self-aligned, sub-micron width Lift-off process
Capacitance Dispersion Within ±1% 100 Hz to 40 GHz, 25°C
Rated DC Voltage 30 V Continuous operation
Dielectric Strength Above 100 V DC 1 minute, 25°C
Intrinsic Chip ESL Below 0.05 nH De-embedded from S-parameters
Q Factor at 1 MHz >2000 Typical
Leakage Current Below 10 nA 30 V DC, 25°C
Dielectric Thermal SiO2, 300 nm Dry oxidation
Chip Dimensions 0.40 × 0.40 × 0.15 mm ±0.025 mm
Operating Temperature -55°C to +125°C


Typical Applications

  • Millimetre-wave front-end modules with fine pad pitch
  • Broadband DC blocking and impedance matching
  • Compact RF filters and couplers
  • Phased-array beamformer elements
  • High-density hybrid microcircuits


Self-Aligned Sub-Micron Metal Electrode MOS Capacitor HACC106S30V330 330pF 30V Dispersion Free Chip