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High Breakdown Voltage MOS Capacitors Ultra Miniature Low Leakage 50V Wire Bondable Capacitor SLC Chip

High Breakdown Voltage MOS Capacitors Ultra Miniature Low Leakage 50V Wire Bondable Capacitor SLC Chip

Brand Name: Hoan
Model Number: HACC101S10V500
MOQ: 10 Pieces
Payment Terms: L/C,D/A,D/P,T/T,Western Union
Detail Information
Place of Origin:
Shannxi,China
Certification:
ISO 9001:2015
Frequency Range:
1 KHz To 1 MHz
Interface Trap Density:
1e10 Cm^-2 EV^-1
Capacitance Range:
1 PF To 100 PF
Leakage Current:
< 1 NA
Substrate Type:
P-type Silicon
Temperature Range:
-40°C To 125°C
Structure:
Metal-Oxide-Semiconductor
Highlight:

High Breakdown Voltage MOS Capacitors

,

Low Leakage Wire Bondable Capacitor

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50V Ultra Miniature MOS Capacitors

Product Description

HACC101S10V500 100pF 50V MOS Capacitor High Breakdown Voltage Low Leakage Wire Bondable Ultra-Miniature SLC Chip


Die-Level Capacitor Assembly Reliability: Breakdown Voltage, Wire Bond Integrity, and the Role of Miniaturization

When a chip capacitor fails in the field, the root cause is rarely a simple electrical overstress. More often, failure traces back to one of three mechanisms: dielectric breakdown accelerated by insufficient voltage margin, wire bond fatigue under thermal cycling, or physical damage during automated assembly of ultra-miniature die. The HACC101S10V500 — a 100pF ±20%, 50V DC Double-Sided Bordered Single Layer Ceramic Capacitor (SLC) — is engineered specifically to eliminate all three failure modes through conservative design margins, metallurgical optimization, and a mechanically robust double-margin architecture.

Dielectric Breakdown Margin: Why 2.5* Derating Matters

The HACC101S10V500 is fabricated with Class I COG/NPO (C0G/NP0) ultra-stable ceramic dielectric optimized for high dielectric strength. The continuous DC voltage rating is 50V, and every die undergoes 100% production testing at substantially elevated voltage to verify dielectric integrity. This conservative derating provides a minimum 2.5* safety margin — exceeding the 2* derating guideline recommended by industry reliability standards for ceramic capacitors in high-reliability applications.

For the circuit designer, this margin translates into real-world robustness: supply transients, load mismatch reflections, and DC bias shifts that might challenge a 16V or 25V-rated capacitor are absorbed with substantial headroom. In GaN power amplifier drain bias networks operating at 28-50V, the HACC101S10V500 provides reliable DC blocking and RF bypass without requiring series stacking of multiple lower-voltage capacitors — reducing component count, assembly complexity, and cumulative tolerance stack-up.

The COG/NPO dielectric also contributes to voltage stability. Unlike ferroelectric Class II dielectrics (X7R, X5R) where capacitance collapses under DC bias as barium titanate domains are clamped, COG/NPO is paraelectric — the capacitance value is stable from 0V to the full rated voltage. This means the bypass impedance you design at 0V DC bias is the same impedance your circuit sees at full operating voltage.

TaN/TiW/Ni/Au Metallization: Engineering the Wire Bond Interface

On a chip measuring just 0.50*0.50mm, the wire bond pad area is typically 200*200μm or smaller. At this scale, the metallurgical quality of the bond pad directly determines assembly yield. The HACC101S10V500 features a four-layer sputtered thin-film stack — TaN/TiW/Ni/Au (≥2.5μm Au minimum) — that has been refined across multiple product generations to deliver consistent, high-strength thermosonic gold wire bonds.

Here is the engineering rationale for each layer, from substrate to bond wire:

Layer Material Thickness Purpose
Foundation TaN Sputtered base Tantalum Nitride forms the strongest known oxide-blocking chemical bond to ceramic dielectric. Under rapid temperature cycling (-55°C to +125°C, ΔT=180°C), this adhesion layer prevents the entire electrode stack from delaminating — a failure mode that manifests as an open circuit after thermal shock testing.
Diffusion Block TiW Sputtered barrier Titanium-Tungsten creates a dense amorphous barrier preventing diffusion of substrate contaminants into the gold layer. Without this barrier, silicon or copper atoms would migrate into the gold over time, forming brittle intermetallic compounds at the bond interface.
Solder Shield Ni Sputtered sacrificial Nickel serves as the industry-standard anti-leaching barrier. During eutectic AuSn reflow at 300-320°C, molten solder aggressively dissolves unprotected gold. The Ni layer is insoluble in both lead-free and leaded solders, completely preventing gold scavenging and preserving solder joint integrity.
Bond Surface Au ≥2.5μm The 2.5μm minimum gold layer provides three critical functions: (1) a thick, ductile buffer that absorbs 40-100mW ultrasonic bonding energy without transmitting damaging stress to the ceramic substrate; (2) an oxidation-free surface that requires no flux or surface preparation before bonding; (3) sufficient gold volume for reliable ball-stitch and wedge-wedge thermosonic bonding.

The same TaN/TiW/Ni/Au stack is applied symmetrically to both top and bottom electrodes, which means the bottom electrode enjoys identical protection against silver epoxy interdiffusion and solder leaching during die attach.

Double-Sided Bordered Architecture: Protecting Both Electrodes Simultaneously

A distinctive feature of the HACC101S10V500 is its double-sided bordered (margin) design. Unlike single-bordered or borderless capacitors, this chip incorporates an un-metallized, exposed ceramic border on both the top and bottom surfaces. The practical benefit for assembly engineers is twofold:

Bottom Margin — Epoxy Containment: During conductive silver epoxy (H20E) die attach, the bottom ceramic border forms a physical containment ring around the gold electrode. When the pick-and-place collet presses the chip down, excess epoxy flows outward but cannot climb beyond the border margin. The result: zero instances of epoxy bridging from the bottom electrode, up the chip sidewall, to the top gold pad — a common defect mode in borderless chip capacitors that generates latent short-circuit failures.

Top Margin — Bond Zone Definition: The top ceramic border creates a clearly visible reference edge for automated wire bonders. The bonding wedge or ball capillary must land at least 25μm inside the gold electrode edge — the ceramic margin provides an unambiguous optical boundary for the machine vision system. Bonds placed too close to the electrode edge risk ceramic micro-cracking; the margin eliminates this ambiguity and enables high-speed bonding without manual inspection between parts.

This symmetrical structure also delivers an operational benefit: both faces of the chip are functionally identical, eliminating top/bottom orientation requirements during pick-and-place. In a production line running millions of placements per year, eliminating a single vision inspection step per component produces measurable throughput gains.

Ultra-Compact 0.50*0.50*0.15mm: Small Size, Big Impact

At 0.50*0.50*0.15mm (20*20*6 mil), the HACC101S10V500 occupies just 0.25mm² of carrier area — achieving a capacitance density enabled by the High-K ceramic formulation (K≈140 for X7R variants). This footprint represents a 4* area reduction compared to standard 30 mil SLCs and a 2* reduction versus 0402 SMD MLCCs. For high-density RF modules where every square micron counts — phased-array beamformers, multi-channel transceivers, filter banks — this density advantage translates directly to more functionality per module.

The 0.15mm (6 mil) ultra-low profile is equally significant. Standard 0402 MLCCs stand 0.50mm tall; the HACC101S10V500 is less than one-third that height. In hermetic hybrid modules with tight lid clearance, in vertically-stacked multi-chip assemblies, and in thin-form-factor consumer devices, this Z-height advantage eliminates the capacitor as the tallest component on the substrate — often enabling one full generation of thickness reduction.

Best Practices for High-Yield Assembly

  • Die Attach: Apply a controlled micro-dot of conductive silver epoxy (Epotek H20E) using pneumatic micro-dispenser. Cure at 120°C for 30 minutes with ramp rate below 10°C/sec. The bottom ceramic border naturally contains excess epoxy — no need for precision volumetric control beyond ±20%.
  • Wire Bonding: 25μm (1 mil) Au wire, thermosonic ball or wedge bonding at 120-150°C stage temperature. Bond landing point must be ≥25μm from the top gold electrode edge — the ceramic margin provides the visual reference for this clearance. Recommended bond parameters: 15-35gf force, 40-100mW ultrasonic, 10-50ms duration.
  • Inspection: Post-bond visual inspection at 50* magnification. Reject bonds with >25% pad deformation, visible cratering, or placement within 25μm of electrode margin. Verify bottom epoxy fillet is contained within the ceramic border — no epoxy visible on chip sidewalls.
  • Storage: Waffle packs or gel-paks in nitrogen-purged cabinet at 20-25°C, 40-60% RH. 1-year guaranteed shelf life; unlimited floor life at ≤30°C/85%RH (MSL 1).

Key Application Areas

  • RF Power Amplifier Modules: DC blocking and supply bypass in GaN-on-SiC HEMT output stages operating at 28-50V drain voltage. The 2.5* voltage margin and COG/NPO dielectric provide reliable bypass without capacitance droop under full bias.
  • Phased-Array Antenna Systems: 100pF inter-stage coupling with low ESR and consistent bond pull strength across thousands of bonds per array panel. Double-sided border enables fully automated assembly at maximum throughput.
  • Optical Transceiver DC Blocks (100G/400G QSFP-DD): Ultra-low 0.15mm profile fits within hermetic TOSA/ROSA module lids. Low DF ensures minimal signal integrity degradation at 25-56Gbaud PAM4 data rates.
  • Precision Instrumentation Front-Ends: Near-zero TCC and VCC maintain calibration accuracy across temperature without requiring software compensation tables.
  • Automotive Radar & V2X Communication: -55°C to +125°C full parametric compliance covers under-hood and exterior-mounted electronics with substantial margin beyond AEC-Q200 Grade 1 requirements.
  • IoT & Edge Computing RF Modules: Compact footprint and wire-bond integration enable chip-scale co-packaging with transceiver ICs in space-constrained sensor nodes and edge gateways.

Contact us for evaluation kits including 25 dice in waffle pack with lot-specific test data, S-parameter characterization files, and detailed assembly process recommendations for your specific bonding platform.