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High Thermal Conductivity Silicon Substrate MOS Capacitor 220 pF 50V Single Layer Chip For RF Power Amplifiers

High Thermal Conductivity Silicon Substrate MOS Capacitor 220 pF 50V Single Layer Chip For RF Power Amplifiers

Brand Name: Hoan
Model Number: HACC221S50V500
MOQ: 10 Pieces
Payment Terms: T/T,L/C,D/A,D/P
Detail Information
Place of Origin:
Shaanxi, China
Certification:
ISO 9001:2015, RoHS
Capacitance:
220 PF ±10% (±5% Available)
Rated DC Voltage:
50 V
Chip Dimensions:
0.50 X 0.50 X 0.15 Mm
Intrinsic ESL:
<0.05 NH
TCC:
+35 Ppm/°C
Operating Temperature:
-55°C To +125°C
RoHS:
Compliant (EU 2015/863)
Highlight:

High thermal conductivity MOS capacitor

,

220 pF 50V MOS capacitor

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Single layer chip MOS capacitor

Product Description

High Thermal Conductivity Silicon Substrate MOS Capacitor — 220 pF / 50 V (HACC221S50V500)


What Is a High Thermal Conductivity Silicon Substrate MOS Capacitor?


The HACC221S50V500 is a single layer MOS capacitor fabricated on a high thermal conductivity silicon substrate with a thermally grown SiO2 dielectric. It is designed to conduct heat away from the active die instead of trapping it, which keeps the capacitor cooler and more stable during continuous RF power operation. It is a wire-bondable RF capacitor rated 220 pF ±10% at 50 V DC in a 0.50 × 0.50 × 0.15 mm chip.


Key Specifications (typical, 25 °C)


Nominal capacitance 220 pF ±10% (±5% available)
Rated DC voltage 50 V
Substrate thermal conductivity >140 W/m·K
Thermal resistance (junction to carrier) <15 K/W
Dielectric Thermal SiO2, 300 nm
Substrate High thermal conductivity silicon
Intrinsic ESL <0.05 nH
Self-resonant frequency >6 GHz (with 0.5 mm bond wire)
Q factor @ 1 MHz >2000
TCC +35 ppm/°C
Operating temperature -55 °C to +125 °C
Chip dimensions 0.50 × 0.50 × 0.15 mm
Metallization Top TiW-Au (2.5 µm min), backside TiW-Pt-Au (1.0 µm min)
Moisture sensitivity level MSL 1
RoHS Compliant (EU 2015/863)


Thermal Path Comparison


Parameter This MOS capacitor Ceramic carrier capacitor
Substrate thermal conductivity >140 W/m·K Typically 2-30 W/m·K
Junction-to-carrier thermal resistance <15 K/W Higher, depends on carrier
Heat path Silicon substrate to backside metal Limited by insulator
Capacitance vs. DC bias Stable up to rated voltage Can drop (Class II)


Typical Applications


  • RF power amplifier decoupling and DC blocking
  • Phased-array transmit and receive modules
  • High-density multi-chip RF modules
  • 5G small cell and backhaul radio front-ends
  • Industrial RF heating and power conversion equipment


High Thermal Conductivity Silicon Substrate MOS Capacitor 220 pF 50V Single Layer Chip For RF Power Amplifiers