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Ultra Low Noise MOS Capacitor HACC101S30V220 22pF 30V Hot Carrier Noise Control for LNA

Ultra Low Noise MOS Capacitor HACC101S30V220 22pF 30V Hot Carrier Noise Control for LNA

Brand Name: Hoan
Model Number: HACC101S30V220
MOQ: 10 Pieces
Payment Terms: L/C,D/A,D/P,T/T
Detail Information
Place of Origin:
Shaanxi, China
Certification:
ISO 9001:2015, RoHS
Top Metallization:
Au, 2.5 Um Min
Backside Metallization:
Au, 1.0 Um Min
Operating Temperature:
-55°C To +125°C
RoHS:
EU 2015/863 Compliant
ESD Class:
Class 0 (HBM)
Mounting Type:
Wire Bondable / Eutectic Die Attach
Highlight:

Ultra Low Noise MOS Capacitor

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HACC101S30V220 22pF MOS Capacitor

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30V MOS Capacitor for LNA

Product Description

Ultra Low Noise MOS Capacitor HACC101S30V220 22pF 30V


Summary: The HACC101S30V220 is a 22 pF ±10%, 30 V DC single-layer MOS (metal-oxide-semiconductor) capacitor built on a float-zone silicon substrate with a 300 nm thermal SiO2 dielectric. It is designed for ultra-low noise amplifier (LNA) input matching and DC blocking, where component noise and interface behaviour determine the receiver noise figure.


Overview

The HACC101S30V220 uses a single-layer MOS structure instead of a multilayer ceramic stack. The chip measures 0.50 × 0.50 × 0.15 mm with 2.5 µm minimum gold top metallization and 1.0 µm minimum backside gold. It is wire bondable and compatible with eutectic die attach, and is offered in standard ±10% (K) and ±5% (J) capacitance tolerances.


Key Features

  • Hot-carrier thermal noise control: intrinsic chip ESL below 0.05 nH with low interface trap density.
  • Hot-carrier noise suppression: no piezoelectric or microphonic output.
  • 22 pF ±10% (5% available) at 30 V DC with no DC bias capacitance derating.
  • Q > 2000 at 1 MHz and > 300 at 1 GHz; ESR below 0.1 Ω at 1 GHz.
  • Float-zone silicon substrate above 1000 Ω·cm for low substrate loss.
  • TiW-Au top electrode and TiW-Pt-Au backside for wire bond and eutectic die attach.
  • Available in custom capacitance values on the same 0.50 mm platform.


Electrical Specifications (T = 25°C unless noted)

Parameter Value Test Condition
Capacitance 22 pF ±10% 1 MHz, 1.0 Vrms
Capacitance Tolerance Options ±10% (K), ±5% (J)
Rated DC Voltage 30 V Continuous operation
Dielectric Strength Above 100 V DC 1 minute, 25°C
Intrinsic Chip ESL Below 0.05 nH De-embedded from S-parameters
Q Factor >2000 at 1 MHz, >300 at 1 GHz Typical
ESR at 1 GHz Below 0.1 Ω Typical
Leakage Current Below 10 nA 30 V DC, 25°C
Piezoelectric Output Below noise floor 10 g, 20 Hz-2 kHz sweep
Dielectric Thermal SiO2, 300 nm Dry oxidation
Substrate Float-zone Si, above 1000 Ω·cm High-resistivity
Chip Dimensions 0.50 × 0.50 × 0.15 mm ±0.025 mm
Top / Backside Metal Au 2.5 µm / Au 1.0 µm TiW adhesion layer
Operating Temperature -55°C to +125°C


Typical Applications

  • Ultra-low noise amplifier (LNA) input matching and DC blocking
  • Low phase noise VCO and PLL oscillator tank circuits
  • RF receiver front ends and array beamformer modules
  • Low-noise bias injection and power supply decoupling
  • Noise-sensitive test and measurement instrumentation


Ultra Low Noise MOS Capacitor HACC101S30V220 22pF 30V Hot Carrier Noise Control for LNA