| Brand Name: | Hoan |
| Model Number: | HACC101S30V220 |
| MOQ: | 10 Pieces |
| Payment Terms: | L/C,D/A,D/P,T/T |
Summary: The HACC101S30V220 is a 22 pF ±10%, 30 V DC single-layer MOS (metal-oxide-semiconductor) capacitor built on a float-zone silicon substrate with a 300 nm thermal SiO2 dielectric. It is designed for ultra-low noise amplifier (LNA) input matching and DC blocking, where component noise and interface behaviour determine the receiver noise figure.
The HACC101S30V220 uses a single-layer MOS structure instead of a multilayer ceramic stack. The chip measures 0.50 × 0.50 × 0.15 mm with 2.5 µm minimum gold top metallization and 1.0 µm minimum backside gold. It is wire bondable and compatible with eutectic die attach, and is offered in standard ±10% (K) and ±5% (J) capacitance tolerances.
| Parameter | Value | Test Condition |
|---|---|---|
| Capacitance | 22 pF ±10% | 1 MHz, 1.0 Vrms |
| Capacitance Tolerance Options | ±10% (K), ±5% (J) | — |
| Rated DC Voltage | 30 V | Continuous operation |
| Dielectric Strength | Above 100 V DC | 1 minute, 25°C |
| Intrinsic Chip ESL | Below 0.05 nH | De-embedded from S-parameters |
| Q Factor | >2000 at 1 MHz, >300 at 1 GHz | Typical |
| ESR at 1 GHz | Below 0.1 Ω | Typical |
| Leakage Current | Below 10 nA | 30 V DC, 25°C |
| Piezoelectric Output | Below noise floor | 10 g, 20 Hz-2 kHz sweep |
| Dielectric | Thermal SiO2, 300 nm | Dry oxidation |
| Substrate | Float-zone Si, above 1000 Ω·cm | High-resistivity |
| Chip Dimensions | 0.50 × 0.50 × 0.15 mm | ±0.025 mm |
| Top / Backside Metal | Au 2.5 µm / Au 1.0 µm | TiW adhesion layer |
| Operating Temperature | -55°C to +125°C | — |
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