Superior Voltage Breakdown 1000 pF 100 V MOS Capacitor (HACC102S100V500) — Stable Dielectric, Wire-Bondable Eutectic Die Attach Chip
Summary: The Hoan HACC102S100V500 is a 1000 pF ±10% single-layer MOS capacitor rated at 100 V DC, with a dielectric withstanding voltage above 250 V DC (250% of the rated voltage), a stable 0 ±30 ppm/°C dielectric over -55°C to +125°C, and a metallisation system ready for both gold wire bonding and AuSn eutectic die attach.
What Is a Single-Layer MOS Capacitor?
A MOS capacitor (Metal–Oxide–Semiconductor capacitor) is a single-layer capacitor that uses a thermally grown silicon dioxide (SiO2) dielectric on a high-resistivity silicon substrate, with metal electrodes on the top and bottom. With no internal electrode stack, current flows vertically through one dielectric layer, giving a near-zero intrinsic equivalent series inductance (ESL), a high self-resonant frequency (SRF) and predictable temperature behaviour compared with multilayer ceramic capacitors (MLCCs).
Key Performance Advantages
- Superior Voltage Breakdown — dielectric withstanding voltage greater than 250 V DC (250% of the 100 V continuous rating), 100% production tested per piece.
- Dielectric Stability — Class I COG/NPO-equivalent thermal SiO2 with a temperature coefficient of 0 ±30 ppm/°C from -55°C to +125°C, a negligible DC-bias coefficient (<10 ppm/V) and no ferroelectric aging.
- Wire-Bondable & Eutectic Die Attach Ready — a top TiW-Au stack (≥2.5 µm Au) supports 25 µm gold wire bonding with >6 gf pull strength; the backside TiW-Pt-Au with a platinum diffusion barrier enables reliable AuSn (80/20) eutectic and conductive-epoxy die attach.
- Low Leakage — <10 nA at 25°C and <100 nA at 125°C at rated voltage.
- Low ESR — typically <0.1 Ω at 1 GHz for efficient RF bypass.
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Electrical Specifications (T = 25°C unless noted)
| Parameter | Value | Condition |
| Capacitance | 1000 pF ±10% (±5% available) | 1 MHz, 1.0 Vrms |
| Rated Voltage (DC) | 100 V | Continuous |
| Dielectric Withstanding Voltage | >250 V DC (250% rated) | 5 s dwell, 100% tested |
| TCC | 0 ±30 ppm/°C | -55°C to +125°C |
| Dissipation Factor | ≤0.15% | 1 kHz, 1.0 Vrms |
| Leakage Current | <10 nA @ 25°C / <100 nA @ 125°C | At rated voltage |
| Insulation Resistance | ≥10⁴ MΩ | At rated voltage, 25°C |
| ESR @ 1 GHz | <0.1 Ω | Typical |
| Intrinsic Chip ESL | <0.05 nH | De-embedded |
| Self-Resonant Frequency | >1.5 GHz chip-level; >600 MHz with 0.5 mm bond wire | Typical |
| Dielectric Absorption | <0.1% | 1 kHz |
| Chip Dimensions | 0.50 × 0.50 × 0.15 mm | ±25 µm |
| Top Metallization | TiW-Au, ≥2.5 µm Au | Wire bondable |
| Backside Metallization | TiW-Pt-Au, ≥1.0 µm Au (Pt barrier) | AuSn / epoxy ready |
| Wire Bond Pull Strength | >6 gf for 25 µm Au wire | MIL-STD-883 Method 2011.7 |
| ESD Rating | Class 0 (HBM) per JESD22-A114 | - |