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Superior Voltage Breakdown 1000pF 100V MOS Capacitor Stable Dielectric Wire Bondable Eutectic Chip

Superior Voltage Breakdown 1000pF 100V MOS Capacitor Stable Dielectric Wire Bondable Eutectic Chip

Brand Name: Hoan
Model Number: HACC102S100V500
MOQ: 10 Pieces
Payment Terms: L/C,D/A,D/P,T/T
Detail Information
Place of Origin:
Shaanxi, China
Certification:
ISO 9001:2015, RoHS, REACH
Mounting Type:
Wire Bondable / Eutectic Die Attach (AuSn)
Wire Bond Pull Strength:
>6 Gf For 25 Um Au Wire
Operating Temperature:
-55 C To +125 C
ESD Rating:
Class 0 (HBM) Per JESD22-A114
Customization:
Capacitance 10 PF-1000 PF, Voltage 6.3 V-200 V, Die Geometry And Metallization Available
Packaging:
ESD-safe Conductive Waffle Pack Or Gel-pak, Nitrogen Dry-pack Export Carton
Certification:
ISO 9001:2015, RoHS, REACH
Highlight:

1000pF MOS capacitor stable dielectric

,

100V MOS capacitor wire bondable

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eutectic chip MOS capacitor

Product Description

Superior Voltage Breakdown 1000 pF 100 V MOS Capacitor (HACC102S100V500) — Stable Dielectric, Wire-Bondable Eutectic Die Attach Chip


Summary: The Hoan HACC102S100V500 is a 1000 pF ±10% single-layer MOS capacitor rated at 100 V DC, with a dielectric withstanding voltage above 250 V DC (250% of the rated voltage), a stable 0 ±30 ppm/°C dielectric over -55°C to +125°C, and a metallisation system ready for both gold wire bonding and AuSn eutectic die attach.


What Is a Single-Layer MOS Capacitor?

A MOS capacitor (Metal–Oxide–Semiconductor capacitor) is a single-layer capacitor that uses a thermally grown silicon dioxide (SiO2) dielectric on a high-resistivity silicon substrate, with metal electrodes on the top and bottom. With no internal electrode stack, current flows vertically through one dielectric layer, giving a near-zero intrinsic equivalent series inductance (ESL), a high self-resonant frequency (SRF) and predictable temperature behaviour compared with multilayer ceramic capacitors (MLCCs).


Key Performance Advantages

  • Superior Voltage Breakdown — dielectric withstanding voltage greater than 250 V DC (250% of the 100 V continuous rating), 100% production tested per piece.
  • Dielectric Stability — Class I COG/NPO-equivalent thermal SiO2 with a temperature coefficient of 0 ±30 ppm/°C from -55°C to +125°C, a negligible DC-bias coefficient (<10 ppm/V) and no ferroelectric aging.
  • Wire-Bondable & Eutectic Die Attach Ready — a top TiW-Au stack (≥2.5 µm Au) supports 25 µm gold wire bonding with >6 gf pull strength; the backside TiW-Pt-Au with a platinum diffusion barrier enables reliable AuSn (80/20) eutectic and conductive-epoxy die attach.
  • Low Leakage — <10 nA at 25°C and <100 nA at 125°C at rated voltage.
  • Low ESR — typically <0.1 Ω at 1 GHz for efficient RF bypass.


Superior Voltage Breakdown 1000pF 100V MOS Capacitor Stable Dielectric Wire Bondable Eutectic Chip

Electrical Specifications (T = 25°C unless noted)

Parameter Value Condition
Capacitance 1000 pF ±10% (±5% available) 1 MHz, 1.0 Vrms
Rated Voltage (DC) 100 V Continuous
Dielectric Withstanding Voltage >250 V DC (250% rated) 5 s dwell, 100% tested
TCC 0 ±30 ppm/°C -55°C to +125°C
Dissipation Factor ≤0.15% 1 kHz, 1.0 Vrms
Leakage Current <10 nA @ 25°C / <100 nA @ 125°C At rated voltage
Insulation Resistance ≥10⁴ MΩ At rated voltage, 25°C
ESR @ 1 GHz <0.1 Ω Typical
Intrinsic Chip ESL <0.05 nH De-embedded
Self-Resonant Frequency >1.5 GHz chip-level; >600 MHz with 0.5 mm bond wire Typical
Dielectric Absorption <0.1% 1 kHz
Chip Dimensions 0.50 × 0.50 × 0.15 mm ±25 µm
Top Metallization TiW-Au, ≥2.5 µm Au Wire bondable
Backside Metallization TiW-Pt-Au, ≥1.0 µm Au (Pt barrier) AuSn / epoxy ready
Wire Bond Pull Strength >6 gf for 25 µm Au wire MIL-STD-883 Method 2011.7
ESD Rating Class 0 (HBM) per JESD22-A114 -